Guanglei Zhou

Guanglei Zhou, Bhargav Korrapati, Gaurav Rajavendra Reddy et al.

Generating diverse VLSI layout patterns is essential for various downstream tasks in design for manufacturing, as design rules continually evolve during the development of new technology nodes. However, existing training-based methods for layout pattern generation rely on large datasets. In practical scenarios, especially when developing a new technology node, obtaining such extensive layout data is challenging. Consequently, training models with large datasets becomes impractical, limiting the scalability and adaptability of prior approaches. To this end, we propose PatternPaint, a diffusion-based framework capable of generating legal patterns with limited design-rule-compliant training samples. PatternPaint simplifies complex layout pattern generation into a series of inpainting processes with a template-based denoising scheme. Furthermore, we perform few-shot finetuning on a pretrained image foundation model with only 20 design-rule-compliant samples. Experimental results show that using a sub-3nm technology node (Intel 18A), our model is the only one that can generate legal patterns in complex 2D metal interconnect design rule settings among all previous works and achieves a high diversity score. Additionally, our few-shot finetuning can boost the legality rate with 1.87X improvement compared to the original pretrained model. As a result, we demonstrate a production-ready approach for layout pattern generation in developing new technology nodes.

Jingyu Pan, Guanglei Zhou, Chen-Chia Chang et al.

Within the rapidly evolving domain of Electronic Design Automation (EDA), Large Language Models (LLMs) have emerged as transformative technologies, offering unprecedented capabilities for optimizing and automating various aspects of electronic design. This survey provides a comprehensive exploration of LLM applications in EDA, focusing on advancements in model architectures, the implications of varying model sizes, and innovative customization techniques that enable tailored analytical insights. By examining the intersection of LLM capabilities and EDA requirements, the paper highlights the significant impact these models have on extracting nuanced understandings from complex datasets. Furthermore, it addresses the challenges and opportunities in integrating LLMs into EDA workflows, paving the way for future research and application in this dynamic field. Through this detailed analysis, the survey aims to offer valuable insights to professionals in the EDA industry, AI researchers, and anyone interested in the convergence of advanced AI technologies and electronic design.

Qijun Zhang, Shiyu Li, Guanglei Zhou et al.

Power efficiency is a critical design objective in modern microprocessor design. To evaluate the impact of architectural-level design decisions, an accurate yet efficient architecture-level power model is desired. However, widely adopted data-independent analytical power models like McPAT and Wattch have been criticized for their unreliable accuracy. While some machine learning (ML) methods have been proposed for architecture-level power modeling, they rely on sufficient known designs for training and perform poorly when the number of available designs is limited, which is typically the case in realistic scenarios. In this work, we derive a general formulation that unifies existing architecture-level power models. Based on the formulation, we propose PANDA, an innovative architecture-level solution that combines the advantages of analytical and ML power models. It achieves unprecedented high accuracy on unknown new designs even when there are very limited designs for training, which is a common challenge in practice. Besides being an excellent power model, it can predict area, performance, and energy accurately. PANDA further supports power prediction for unknown new technology nodes. In our experiments, besides validating the superior performance and the wide range of functionalities of PANDA, we also propose an application scenario, where PANDA proves to identify high-performance design configurations given a power constraint.

Jingyu Pan, Isaac Jacobson, Zheng Zhao et al.

Modern very large-scale integration (VLSI) design requires the implementation of integrated circuits using electronic design automation (EDA) tools. Due to the complexity of EDA algorithms, the vast parameter space poses a huge challenge to chip design optimization, as the combination of even moderate numbers of parameters creates an enormous solution space to explore. Manual parameter selection remains industrial practice despite being excessively laborious and limited by expert experience. To address this issue, we present CROP, the first large language model (LLM)-powered automatic VLSI design flow tuning framework. Our approach includes: (1) a scalable methodology for transforming RTL source code into dense vector representations, (2) an embedding-based retrieval system for matching designs with semantically similar circuits, and (3) a retrieval-augmented generation (RAG)-enhanced LLM-guided parameter search system that constrains the search process with prior knowledge from similar designs. Experiment results demonstrate CROP's ability to achieve superior quality-of-results (QoR) with fewer iterations than existing approaches on industrial designs, including a 9.9% reduction in power consumption.