Lin Zschiedrich

Kirankumar R. Hiremath, Lin Zschiedrich, Frank Schmidt

Nonlocal material response distinctively changes the optical properties of nano-plasmonic scatterers and waveguides. It is described by the nonlocal hydrodynamic Drude model, which -- in frequency domain -- is given by a coupled system of equations for the electric field and an additional polarization current of the electron gas modeled analogous to a hydrodynamic flow. Recent works encountered difficulties in dealing with the grad-div operator appearing in the governing equation of the hydrodynamic current. Therefore, in these studies the model has been simplified with the curl-free hydrodynamic current approximation; but this causes spurious resonances. In this paper we present a rigorous weak formulation in the Sobolev spaces $H(\mathrm{curl})$ for the electric field and $H(\mathrm{div})$ for the hydrodynamic current, which directly leads to a consistent discretization based on Nédélec's finite element spaces. Comparisons with the Mie theory results agree well. We also demonstrate the capability of the method to handle any arbitrary shaped scatterer.

Philipp-Immanuel Schneider, Martin Hammerschmidt, Lin Zschiedrich et al.

Optical scatterometry is a method to measure the size and shape of periodic micro- or nanostructures on surfaces. For this purpose the geometry parameters of the structures are obtained by reproducing experimental measurement results through numerical simulations. We compare the performance of Bayesian optimization to different local minimization algorithms for this numerical optimization problem. Bayesian optimization uses Gaussian-process regression to find promising parameter values. We examine how pre-computed simulation results can be used to train the Gaussian process and to accelerate the optimization.

Achim Schädle, Lin Zschiedrich, Sven Burger et al.

We present a domain decomposition approach for the computation of the electromagnetic field within periodic structures. We use a Schwarz method with transparent boundary conditions at the interfaces of the domains. Transparent boundary conditions are approximated by the perfectly matched layer method (PML). To cope with Wood anomalies appearing in periodic structures an adaptive strategy to determine optimal PML parameters is developed. We focus on the application to typical EUV lithography line masks. Light propagation within the multi-layer stack of the EUV mask is treated analytically. This results in a drastic reduction of the computational costs and allows for the simulation of next generation lithography masks on a standard personal computer.