Sumit Jain

Mingjie Liu, Teodor-Dumitru Ene, Robert Kirby et al.

ChipNeMo aims to explore the applications of large language models (LLMs) for industrial chip design. Instead of directly deploying off-the-shelf commercial or open-source LLMs, we instead adopt the following domain adaptation techniques: domain-adaptive tokenization, domain-adaptive continued pretraining, model alignment with domain-specific instructions, and domain-adapted retrieval models. We evaluate these methods on three selected LLM applications for chip design: an engineering assistant chatbot, EDA script generation, and bug summarization and analysis. Our evaluations demonstrate that domain-adaptive pretraining of language models, can lead to superior performance in domain related downstream tasks compared to their base LLaMA2 counterparts, without degradations in generic capabilities. In particular, our largest model, ChipNeMo-70B, outperforms the highly capable GPT-4 on two of our use cases, namely engineering assistant chatbot and EDA scripts generation, while exhibiting competitive performance on bug summarization and analysis. These results underscore the potential of domain-specific customization for enhancing the effectiveness of large language models in specialized applications.

Ghasem Pasandi, Kishor Kunal, Varun Tej et al.

This paper presents JARVIS, a novel multi-agent framework that leverages Large Language Models (LLMs) and domain expertise to generate high-quality scripts for specialized Electronic Design Automation (EDA) tasks. By combining a domain-specific LLM trained with synthetically generated data, a custom compiler for structural verification, rule enforcement, code fixing capabilities, and advanced retrieval mechanisms, our approach achieves significant improvements over state-of-the-art domain-specific models. Our framework addresses the challenges of data scarcity and hallucination errors in LLMs, demonstrating the potential of LLMs in specialized engineering domains. We evaluate our framework on multiple benchmarks and show that it outperforms existing models in terms of accuracy and reliability. Our work sets a new precedent for the application of LLMs in EDA and paves the way for future innovations in this field.