Zhenyu Sun

Chao Shen, Wenkang Zhan, Kaiyao Xin et al.

Self-assembled InAs/GaAs quantum dots (QDs) have properties highly valuable for developing various optoelectronic devices such as QD lasers and single photon sources. The applications strongly rely on the density and quality of these dots, which has motivated studies of the growth process control to realize high-quality epi-wafers and devices. Establishing the process parameters in molecular beam epitaxy (MBE) for a specific density of QDs is a multidimensional optimization challenge, usually addressed through time-consuming and iterative trial-and-error. Here, we report a real-time feedback control method to realize the growth of QDs with arbitrary density, which is fully automated and intelligent. We developed a machine learning (ML) model named 3D ResNet 50 trained using reflection high-energy electron diffraction (RHEED) videos as input instead of static images and providing real-time feedback on surface morphologies for process control. As a result, we demonstrated that ML from previous growth could predict the post-growth density of QDs, by successfully tuning the QD densities in near-real time from 1.5E10 cm-2 down to 3.8E8 cm-2 or up to 1.4E11 cm-2. Compared to traditional methods, our approach, with in situ tuning capabilities and excellent reliability, can dramatically expedite the material optimization process and improve the reproducibility of MBE, constituting significant progress for thin film growth techniques. The concepts and methodologies proved feasible in this work are promising to be applied to a variety of material growth processes, which will revolutionize semiconductor manufacturing for optoelectronic and microelectronic industries.

Jianxun Ren, Ning An, Youjia Zhang et al.

Cortical surface registration plays a crucial role in aligning cortical functional and anatomical features across individuals. However, conventional registration algorithms are computationally inefficient. Recently, learning-based registration algorithms have emerged as a promising solution, significantly improving processing efficiency. Nonetheless, there remains a gap in the development of a learning-based method that exceeds the state-of-the-art conventional methods simultaneously in computational efficiency, registration accuracy, and distortion control, despite the theoretically greater representational capabilities of deep learning approaches. To address the challenge, we present SUGAR, a unified unsupervised deep-learning framework for both rigid and non-rigid registration. SUGAR incorporates a U-Net-based spherical graph attention network and leverages the Euler angle representation for deformation. In addition to the similarity loss, we introduce fold and multiple distortion losses, to preserve topology and minimize various types of distortions. Furthermore, we propose a data augmentation strategy specifically tailored for spherical surface registration, enhancing the registration performance. Through extensive evaluation involving over 10,000 scans from 7 diverse datasets, we showed that our framework exhibits comparable or superior registration performance in accuracy, distortion, and test-retest reliability compared to conventional and learning-based methods. Additionally, SUGAR achieves remarkable sub-second processing times, offering a notable speed-up of approximately 12,000 times in registering 9,000 subjects from the UK Biobank dataset in just 32 minutes. This combination of high registration performance and accelerated processing time may greatly benefit large-scale neuroimaging studies.

Jingfeng Guo, Jinnan Chen, Weikai Chen et al.

This work presents GarmentX, a novel framework for generating diverse, high-fidelity, and wearable 3D garments from a single input image. Traditional garment reconstruction methods directly predict 2D pattern edges and their connectivity, an overly unconstrained approach that often leads to severe self-intersections and physically implausible garment structures. In contrast, GarmentX introduces a structured and editable parametric representation compatible with GarmentCode, ensuring that the decoded sewing patterns always form valid, simulation-ready 3D garments while allowing for intuitive modifications of garment shape and style. To achieve this, we employ a masked autoregressive model that sequentially predicts garment parameters, leveraging autoregressive modeling for structured generation while mitigating inconsistencies in direct pattern prediction. Additionally, we introduce GarmentX dataset, a large-scale dataset of 378,682 garment parameter-image pairs, constructed through an automatic data generation pipeline that synthesizes diverse and high-quality garment images conditioned on parametric garment representations. Through integrating our method with GarmentX dataset, we achieve state-of-the-art performance in geometric fidelity and input image alignment, significantly outperforming prior approaches. We will release GarmentX dataset upon publication.