Tao Han

Chuang Yang, Xu Han, Tao Han et al.

Pursuing efficient text shape representations helps scene text detection models focus on compact foreground regions and optimize the contour reconstruction steps to simplify the whole detection pipeline. Current approaches either represent irregular shapes via box-to-polygon strategy or decomposing a contour into pieces for fitting gradually, the deficiency of coarse contours or complex pipelines always exists in these models. Considering the above issues, we introduce EdgeText to fit text contours compactly while alleviating excessive contour rebuilding processes. Concretely, it is observed that the two long edges of texts can be regarded as smooth curves. It allows us to build contours via continuous and smooth edges that cover text regions tightly instead of fitting piecewise, which helps avoid the two limitations in current models. Inspired by this observation, EdgeText formulates the text representation as the edge approximation problem via parameterized curve fitting functions. In the inference stage, our model starts with locating text centers, and then creating curve functions for approximating text edges relying on the points. Meanwhile, truncation points are determined based on the location features. In the end, extracting curve segments from curve functions by using the pixel coordinate information brought by truncation points to reconstruct text contours. Furthermore, considering the deep dependency of EdgeText on text edges, a bilateral enhanced perception (BEP) module is designed. It encourages our model to pay attention to the recognition of edge features. Additionally, to accelerate the learning of the curve function parameters, we introduce a proportional integral loss (PI-loss) to force the proposed model to focus on the curve distribution and avoid being disturbed by text scales.

Tao Han, Zahra Taheri, Hyunwoong Ko

Semiconductor manufacturing relies heavily on film deposition processes, such as Chemical Vapor Deposition and Physical Vapor Deposition. These complex processes require precise control to achieve film uniformity, proper adhesion, and desired functionality. Recent advancements in Physics-Informed Neural Networks (PINNs), an innovative machine learning (ML) approach, have shown significant promise in addressing challenges related to process control, quality assurance, and predictive modeling within semiconductor film deposition and other manufacturing domains. This paper provides a comprehensive review of ML applications targeted at semiconductor film deposition processes. Through a thematic analysis, we identify key trends, existing limitations, and research gaps, offering insights into both the advantages and constraints of current methodologies. Our structured analysis aims to highlight the potential integration of these ML techniques to enhance interpretability, accuracy, and robustness in film deposition processes. Additionally, we examine state-of-the-art PINN methods, discussing strategies for embedding physical knowledge, governing laws, and partial differential equations into advanced neural network architectures tailored for semiconductor manufacturing. Based on this detailed review, we propose novel research directions that integrate the strengths of PINNs to significantly advance film deposition processes. The contributions of this study include establishing a clear pathway for future research in integrating physics-informed ML frameworks, addressing existing methodological gaps, and ultimately improving precision, scalability, and operational efficiency within semiconductor manufacturing.