Dong‐Kyu Kim

Banseok Lee, Dongkyu Kim, Youngcheon You et al.

Deploying large language models (LLMs) often faces challenges from substantial memory and computational costs. Quantization offers a solution, yet performance degradation in the sub-1-bit regime remains particularly difficult. This paper introduces LittleBit, a novel method for extreme LLM compression. It targets levels like 0.1 bits per weight (BPW), achieving nearly 31$\times$ memory reduction, e.g., Llama2-13B to under 0.9 GB. LittleBit represents weights in a low-rank form using latent matrix factorization, subsequently binarizing these factors. To counteract information loss from this extreme precision, it integrates a multi-scale compensation mechanism. This includes row, column, and an additional latent dimension that learns per-rank importance. Two key contributions enable effective training: Dual Sign-Value-Independent Decomposition (Dual-SVID) for quantization-aware training (QAT) initialization, and integrated Residual Compensation to mitigate errors. Extensive experiments confirm LittleBit's superiority in sub-1-bit quantization: e.g., its 0.1 BPW performance on Llama2-7B surpasses the leading method's 0.7 BPW. LittleBit establishes a new, viable size-performance trade-off--unlocking a potential 11.6$\times$ speedup over FP16 at the kernel level--and makes powerful LLMs practical for resource-constrained environments.

Hoang Cuong Phan, Minh Tien Tran, Chihun Lee et al.

Synthesizing realistic microstructure images conditioned on processing parameters is crucial for understanding process-structure relationships in materials design. However, this task remains challenging due to limited training micrographs and the continuous nature of processing variables. To overcome these challenges, we present a novel process-aware generative modeling approach based on Stable Diffusion 3.5 Large (SD3.5-Large), a state-of-the-art text-to-image diffusion model adapted for microstructure generation. Our method introduces numeric-aware embeddings that encode continuous variables (annealing temperature, time, and magnification) directly into the model's conditioning, enabling controlled image generation under specified process conditions and capturing process-driven microstructural variations. To address data scarcity and computational constraints, we fine-tune only a small fraction of the model's weights via DreamBooth and Low-Rank Adaptation (LoRA), efficiently transferring the pre-trained model to the materials domain. We validate realism using a semantic segmentation model based on a fine-tuned U-Net with a VGG16 encoder on 24 labeled micrographs. It achieves 97.1% accuracy and 85.7% mean IoU, outperforming previous methods. Quantitative analyses using physical descriptors and spatial statistics show strong agreement between synthetic and real microstructures. Specifically, two-point correlation and lineal-path errors remain below 2.1% and 0.6%, respectively. Our method represents the first adaptation of SD3.5-Large for process-aware microstructure generation, offering a scalable approach for data-driven materials design.