31.1CVDec 4, 2024
Align3R: Aligned Monocular Depth Estimation for Dynamic VideosJiahao Lu, Tianyu Huang, Peng Li et al.
Recent developments in monocular depth estimation methods enable high-quality depth estimation of single-view images but fail to estimate consistent video depth across different frames. Recent works address this problem by applying a video diffusion model to generate video depth conditioned on the input video, which is training-expensive and can only produce scale-invariant depth values without camera poses. In this paper, we propose a novel video-depth estimation method called Align3R to estimate temporal consistent depth maps for a dynamic video. Our key idea is to utilize the recent DUSt3R model to align estimated monocular depth maps of different timesteps. First, we fine-tune the DUSt3R model with additional estimated monocular depth as inputs for the dynamic scenes. Then, we apply optimization to reconstruct both depth maps and camera poses. Extensive experiments demonstrate that Align3R estimates consistent video depth and camera poses for a monocular video with superior performance than baseline methods.
4.1LGAug 21, 2025
Transfer Learning for Minimum Operating Voltage Prediction in Advanced Technology Nodes: Leveraging Legacy Data and Silicon Odometer SensingYuxuan Yin, Rebecca Chen, Boxun Xu et al.
Accurate prediction of chip performance is critical for ensuring energy efficiency and reliability in semiconductor manufacturing. However, developing minimum operating voltage ($V_{min}$) prediction models at advanced technology nodes is challenging due to limited training data and the complex relationship between process variations and $V_{min}$. To address these issues, we propose a novel transfer learning framework that leverages abundant legacy data from the 16nm technology node to enable accurate $V_{min}$ prediction at the advanced 5nm node. A key innovation of our approach is the integration of input features derived from on-chip silicon odometer sensor data, which provide fine-grained characterization of localized process variations -- an essential factor at the 5nm node -- resulting in significantly improved prediction accuracy.