Kang Liang

Da Chen, Guangyu Hu, Kaihong Xu et al.

Extracting high-fidelity 2D contours from Scanning Electron Microscope (SEM) images is critical for calibrating Optical Proximity Correction (OPC) models. While foundation models like Segment Anything 2 (SAM2) are promising, adapting them to specialized domains with scarce annotated data is a major challenge. This paper presents a case study on adapting SAM2 for SEM contour extraction in a few-shot setting. We propose SegSEM, a framework built on two principles: a data-efficient fine-tuning strategy that adapts by selectively training only the model's encoders, and a robust hybrid architecture integrating a traditional algorithm as a confidence-aware fallback. Using a small dataset of 60 production images, our experiments demonstrate this methodology's viability. The primary contribution is a methodology for leveraging foundation models in data-constrained industrial applications.

Zixiao Wang, Jieya Zhou, Su Zheng et al.

Recent decades have witnessed remarkable advancements in artificial intelligence (AI), including large language models (LLMs), image and video generative models, and embodied AI systems. These advancements have led to an explosive increase in the demand for computational power, challenging the limits of Moore's Law. Optical lithography, a critical technology in semiconductor manufacturing, faces significant challenges due to its high costs. To address this, various lithography simulators have been developed. However, many of these simulators are limited by their inadequate photoresist modeling capabilities. This paper presents TorchResist, an open-source, differentiable photoresist simulator.TorchResist employs an analytical approach to model the photoresist process, functioning as a white-box system with at most twenty interpretable parameters. Leveraging modern differentiable programming techniques and parallel computing on GPUs, TorchResist enables seamless co-optimization with other tools across multiple related tasks. Our experimental results demonstrate that TorchResist achieves superior accuracy and efficiency compared to existing solutions. The source code is publicly available.