Sixian Jia

CV
h-index6
3papers
3citations
Novelty52%
AI Score41

3 Papers

CVJan 13
Adaptive few-shot learning for robust part quality classification in two-photon lithography

Sixian Jia, Ruo-Syuan Mei, Chenhui Shao

Two-photon lithography (TPL) is an advanced additive manufacturing (AM) technique for fabricating high-precision micro-structures. While computer vision (CV) is proofed for automated quality control, existing models are often static, rendering them ineffective in dynamic manufacturing environments. These models typically cannot detect new, unseen defect classes, be efficiently updated from scarce data, or adapt to new part geometries. To address this gap, this paper presents an adaptive CV framework for the entire life-cycle of quality model maintenance. The proposed framework is built upon a same, scale-robust backbone model and integrates three key methodologies: (1) a statistical hypothesis testing framework based on Linear Discriminant Analysis (LDA) for novelty detection, (2) a two-stage, rehearsal-based strategy for few-shot incremental learning, and (3) a few-shot Domain-Adversarial Neural Network (DANN) for few-shot domain adaptation. The framework was evaluated on a TPL dataset featuring hemisphere as source domain and cube as target domain structures, with each domain categorized into good, minor damaged, and damaged quality classes. The hypothesis testing method successfully identified new class batches with 99-100% accuracy. The incremental learning method integrated a new class to 92% accuracy using only K=20 samples. The domain adaptation model bridged the severe domain gap, achieving 96.19% accuracy on the target domain using only K=5 shots. These results demonstrate a robust and data-efficient solution for deploying and maintaining CV models in evolving production scenarios.

CVNov 28, 2025
Hybrid Synthetic Data Generation with Domain Randomization Enables Zero-Shot Vision-Based Part Inspection Under Extreme Class Imbalance

Ruo-Syuan Mei, Sixian Jia, Guangze Li et al.

Machine learning, particularly deep learning, is transforming industrial quality inspection. Yet, training robust machine learning models typically requires large volumes of high-quality labeled data, which are expensive, time-consuming, and labor-intensive to obtain in manufacturing. Moreover, defective samples are intrinsically rare, leading to severe class imbalance that degrades model performance. These data constraints hinder the widespread adoption of machine learning-based quality inspection methods in real production environments. Synthetic data generation (SDG) offers a promising solution by enabling the creation of large, balanced, and fully annotated datasets in an efficient, cost-effective, and scalable manner. This paper presents a hybrid SDG framework that integrates simulation-based rendering, domain randomization, and real background compositing to enable zero-shot learning for computer vision-based industrial part inspection without manual annotation. The SDG pipeline generates 12,960 labeled images in one hour by varying part geometry, lighting, and surface properties, and then compositing synthetic parts onto real image backgrounds. A two-stage architecture utilizing a YOLOv8n backbone for object detection and MobileNetV3-small for quality classification is trained exclusively on synthetic data and evaluated on 300 real industrial parts. The proposed approach achieves an mAP@0.5 of 0.995 for detection, 96% classification accuracy, and 90.1% balanced accuracy. Comparative evaluation against few-shot real-data baseline approaches demonstrates significant improvement. The proposed SDG-based approach achieves 90-91% balanced accuracy under severe class imbalance, while the baselines reach only 50% accuracy. These results demonstrate that the proposed method enables annotation-free, scalable, and robust quality inspection for real-world manufacturing applications.

LGOct 16, 2025
Physics-informed data-driven machine health monitoring for two-photon lithography

Sixian Jia, Zhiqiao Dong, Chenhui Shao

Two-photon lithography (TPL) is a sophisticated additive manufacturing technology for creating three-dimensional (3D) micro- and nano-structures. Maintaining the health of TPL systems is critical for ensuring consistent fabrication quality. Current maintenance practices often rely on experience rather than informed monitoring of machine health, resulting in either untimely maintenance that causes machine downtime and poor-quality fabrication, or unnecessary maintenance that leads to inefficiencies and avoidable downtime. To address this gap, this paper presents three methods for accurate and timely monitoring of TPL machine health. Through integrating physics-informed data-driven predictive models for structure dimensions with statistical approaches, the proposed methods are able to handle increasingly complex scenarios featuring different levels of generalizability. A comprehensive experimental dataset that encompasses six process parameter combinations and six structure dimensions under two machine health conditions was collected to evaluate the effectiveness of the proposed approaches. Across all test scenarios, the approaches are shown to achieve high accuracies, demonstrating excellent effectiveness, robustness, and generalizability. These results represent a significant step toward condition-based maintenance for TPL systems.