87.0LGMay 17
LEAP: Learnable End-to-End Adaptive Pruning of Large Language ModelsMohammad Mozaffari, Younes Hourri, Mohammad Rastegari et al.
Unstructured sparsity is now natively accelerated by recent GPU kernels and dataflow hardware, shifting the bottleneck from inference execution to the pruning algorithm. State-of-the-art methods for unstructured LLM pruning are layer-wise surrogates derived from the Optimal Brain Surgeon principle, and they sacrifice end-to-end accuracy, especially under aggressive sparsity. End-to-end alternatives such as MaskLLM and PATCH show that learnable masks can close this gap, but their categorical-over-patterns parameterization scales with the number of valid masks per row and does not port to the unstructured setting. We introduce LEAP, which replaces this intractable parameterization with a per-weight Bernoulli-via-Gumbel- sigmoid relaxation that makes end-to-end unstructured mask learning tractable. Across five LLM families from 0.5B to 8B parameters at 50% and 60% sparsity, LEAP improves six-task average zero-shot accuracy by +2.59 points on average over ADMM, the best layer-wise baseline in our sweep.
LGSep 27, 2025
PATCH: Learnable Tile-level Hybrid Sparsity for LLMsYounes Hourri, Mohammad Mozaffari, Maryam Mehri Dehnavi
Large language models (LLMs) deliver impressive performance but incur prohibitive memory and compute costs at deployment. Model pruning is an effective way to reduce these overheads, yet existing approaches face challenges: unstructured sparsity, where nonzeros can appear anywhere, preserves accuracy but yields irregular access patterns that prevent GPU acceleration, while semi-structured 2:4 sparsity is hardware-friendly but enforces a rigid 50% pattern that degrades model quality. To bridge this gap, we introduce PATCH, a hybrid sparsity framework that enables a continuous sparsity ratio between 0% and 50%. PATCH partitions weight matrices into tiles, assigning each tile to be either dense or 2:4 sparse via a learnable mask selection mechanism. This design provides fine-grained control over accuracy-acceleration tradeoffs and supports non-uniform sparsity across layers, leading to superior overall quality. Across models from 0.5B to 8B parameters, PATCH consistently narrows the gap to dense accuracy while delivering practical speedups. For instance, on LLaMA-2 7B with an A6000 GPU, PATCH achieves 1.18x-1.38x end-to-end speedup over dense baselines while improving accuracy by 0.37%-2.96% compared to the state-of-the-art 2:4 pruning method, MaskLLM.