An Alternating Direction Method of Multipliers for Inverse Lithography Problem
For semiconductor manufacturing, this provides a more efficient and theoretically grounded solution to the inverse lithography problem.
The paper proposes an ADMM-based optimization method for inverse lithography, achieving efficient mask optimization with convergence guarantees. Numerical examples demonstrate effectiveness.
We propose an alternating direction method of multipliers (ADMM) to solve an optimization problem stemming from inverse lithography. The objective functional of the optimization problem includes three terms: the misfit between the imaging on wafer and the target pattern, the penalty term which ensures the mask is binary and the total variation regularization term. By variable splitting, we introduce an augmented Lagrangian for the original objective functional. In the framework of ADMM method, the optimization problem is divided into several subproblems. Each of the subproblems can be solved efficiently. We give the convergence analysis of the proposed method. Specially, instead of solving the subproblem concerning sigmoid, we solve directly the threshold truncation imaging function which can be solved analytically. We also provide many numerical examples to illustrate the effectiveness of the method.