Ano-SuPs: Multi-size anomaly detection for manufactured products by identifying suspected patches
This work addresses anomaly detection in manufacturing quality control, presenting an incremental improvement over existing matrix decomposition methods.
The paper tackles the challenge of detecting anomalies in manufactured products from images with complex backgrounds and varied anomaly patterns, proposing a two-stage method that identifies suspected patches through iterative reconstruction and achieves improved detection performance.
Image-based systems have gained popularity owing to their capacity to provide rich manufacturing status information, low implementation costs and high acquisition rates. However, the complexity of the image background and various anomaly patterns pose new challenges to existing matrix decomposition methods, which are inadequate for modeling requirements. Moreover, the uncertainty of the anomaly can cause anomaly contamination problems, making the designed model and method highly susceptible to external disturbances. To address these challenges, we propose a two-stage strategy anomaly detection method that detects anomalies by identifying suspected patches (Ano-SuPs). Specifically, we propose to detect the patches with anomalies by reconstructing the input image twice: the first step is to obtain a set of normal patches by removing those suspected patches, and the second step is to use those normal patches to refine the identification of the patches with anomalies. To demonstrate its effectiveness, we evaluate the proposed method systematically through simulation experiments and case studies. We further identified the key parameters and designed steps that impact the model's performance and efficiency.