CVMar 7, 2024

MAP: MAsk-Pruning for Source-Free Model Intellectual Property Protection

arXiv:2403.04149v17 citationsh-index: 17CVPR
Originality Incremental advance
AI Analysis

This addresses the need for secure and efficient model IP protection in decentralized private data settings, offering a practical solution for model owners.

The paper tackles the problem of protecting intellectual property for deep learning models by making them exclusive to authorized data domains without needing source training data, achieving state-of-the-art performance in various scenarios.

Deep learning has achieved remarkable progress in various applications, heightening the importance of safeguarding the intellectual property (IP) of well-trained models. It entails not only authorizing usage but also ensuring the deployment of models in authorized data domains, i.e., making models exclusive to certain target domains. Previous methods necessitate concurrent access to source training data and target unauthorized data when performing IP protection, making them risky and inefficient for decentralized private data. In this paper, we target a practical setting where only a well-trained source model is available and investigate how we can realize IP protection. To achieve this, we propose a novel MAsk Pruning (MAP) framework. MAP stems from an intuitive hypothesis, i.e., there are target-related parameters in a well-trained model, locating and pruning them is the key to IP protection. Technically, MAP freezes the source model and learns a target-specific binary mask to prevent unauthorized data usage while minimizing performance degradation on authorized data. Moreover, we introduce a new metric aimed at achieving a better balance between source and target performance degradation. To verify the effectiveness and versatility, we have evaluated MAP in a variety of scenarios, including vanilla source-available, practical source-free, and challenging data-free. Extensive experiments indicate that MAP yields new state-of-the-art performance.

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