Jan Trieschmann

MTRL-SCI
6papers
81citations
Novelty44%
AI Score24

6 Papers

COMP-PHJun 13, 2023
Towards a Machine-Learned Poisson Solver for Low-Temperature Plasma Simulations in Complex Geometries

Ihda Chaerony Siffa, Markus M. Becker, Klaus-Dieter Weltmann et al.

Poisson's equation plays an important role in modeling many physical systems. In electrostatic self-consistent low-temperature plasma (LTP) simulations, Poisson's equation is solved at each simulation time step, which can amount to a significant computational cost for the entire simulation. In this paper, we describe the development of a generic machine-learned Poisson solver specifically designed for the requirements of LTP simulations in complex 2D reactor geometries on structured Cartesian grids. Here, the reactor geometries can consist of inner electrodes and dielectric materials as often found in LTP simulations. The approach leverages a hybrid CNN-transformer network architecture in combination with a weighted multiterm loss function. We train the network using highly-randomized synthetic data to ensure the generalizability of the learned solver to unseen reactor geometries. The results demonstrate that the learned solver is able to produce quantitatively and qualitatively accurate solutions. Furthermore, it generalizes well on new reactor geometries such as reference geometries found in the literature. To increase the numerical accuracy of the solutions required in LTP simulations, we employ a conventional iterative solver to refine the raw predictions, especially to recover the high-frequency features not resolved by the initial prediction. With this, the proposed learned Poisson solver provides the required accuracy and is potentially faster than a pure GPU-based conventional iterative solver. This opens up new possibilities for developing a generic and high-performing learned Poisson solver for LTP systems in complex geometries.

MTRL-SCINov 9, 2022
Physics-separating artificial neural networks for predicting initial stages of Al sputtering and thin film deposition in Ar plasma discharges

Tobias Gergs, Thomas Mussenbrock, Jan Trieschmann

Simulations of Al thin film sputter depositions rely on accurate plasma and surface interaction models. Establishing the latter commonly requires a higher level of abstraction and means to dismiss the fundamental atomic fidelity. Previous works on sputtering processes addressed this issue by establishing machine learning surrogate models, which include a basic surface state (i.e., stoichiometry) as static input. In this work, an evolving surface state and defect structure are introduced to jointly describe sputtering and growth with physics-separating artificial neural networks. The data describing the plasma-surface interactions stem from hybrid reactive molecular dynamics/time-stamped force bias Monte Carlo simulations of Al neutrals and Ar$^+$ ions impinging onto Al(001) surfaces. It is demonstrated that the fundamental processes are comprehensively described by taking the surface state as well as defect structure into account. Hence, a machine learning plasma-surface interaction surrogate model is established that resolves the inherent kinetics with high physical fidelity. The resulting model is not restricted to input from modeling and simulation, but may similarly be applied to experimental input data.

MTRL-SCIJan 9, 2023
Physics-separating artificial neural networks for predicting sputtering and thin film deposition of AlN in Ar/N$_2$ discharges on experimental timescales

Tobias Gergs, Thomas Mussenbrock, Jan Trieschmann

Understanding and modeling plasma-surface interactions frame a multi-scale as well as multi-physics problem. Scale-bridging machine learning surface surrogate models have been demonstrated to perceive the fundamental atomic fidelity for the physical vapor deposition of pure metals. However, the immense computational cost of the data-generating simulations render a practical application with predictions on relevant timescales impracticable. This issue is resolved in this work for the sputter deposition of AlN in Ar/N$_2$ discharges by developing a scheme that populates the parameter spaces effectively. Hybrid reactive molecular dynamics / time-stamped force-bias Monte Carlo simulations of randomized plasma-surface interactions / diffusion processes are used to setup a physics-separating artificial neural network. The application of this generic machine learning model to a specific experimental reference case study enables the systematic analysis of the particle flux emission as well as underlying system state (e.g., composition, mass density, stress, point defect structure) evolution within process times of up to 45 minutes.

PLASM-PHJun 30, 2023
Machine learning for advancing low-temperature plasma modeling and simulation

Jan Trieschmann, Luca Vialetto, Tobias Gergs

Machine learning has had an enormous impact in many scientific disciplines. Also in the field of low-temperature plasma modeling and simulation it has attracted significant interest within the past years. Whereas its application should be carefully assessed in general, many aspects of plasma modeling and simulation have benefited substantially from recent developments within the field of machine learning and data-driven modeling. In this survey, we approach two main objectives: (a) We review the state-of-the-art focusing on approaches to low-temperature plasma modeling and simulation. By dividing our survey into plasma physics, plasma chemistry, plasma-surface interactions, and plasma process control, we aim to extensively discuss relevant examples from literature. (b) We provide a perspective of potential advances to plasma science and technology. We specifically elaborate on advances possibly enabled by adaptation from other scientific disciplines. We argue that not only the known unknowns, but also unknown unknowns may be discovered due to the inherent propensity of data-driven methods to spotlight hidden patterns in data.

COMP-PHSep 3, 2021
An efficient plasma-surface interaction surrogate model for sputtering processes based on autoencoder neural networks

Tobias Gergs, Borislav Borislavov, Jan Trieschmann

Simulations of thin film sputter deposition require the separation of the plasma and material transport in the gas-phase from the growth/sputtering processes at the bounding surfaces. Interface models based on analytic expressions or look-up tables inherently restrict this complex interaction to a bare minimum. A machine learning model has recently been shown to overcome this remedy for Ar ions bombarding a Ti-Al composite target. However, the chosen network structure (i.e., a multilayer perceptron) provides approximately 4 million degrees of freedom, which bears the risk of overfitting the relevant dynamics and complicating the model to an unreliable extend. This work proposes a conceptually more sophisticated but parameterwise simplified regression artificial neural network for an extended scenario, considering a variable instead of a single fixed Ti-Al stoichiometry. A convolutional $β$-variational autoencoder is trained to reduce the high-dimensional energy-angular distribution of sputtered particles to a latent space representation of only two components. In addition to a primary decoder which is trained to reconstruct the input energy-angular distribution, a secondary decoder is employed to reconstruct the mean energy of incident Ar ions as well as the present Ti-Al composition. The mutual latent space is hence conditioned on these quantities. The trained primary decoder of the variational autoencoder network is subsequently transferred to a regression network, for which only the mapping to the particular latent space has to be learned. While obtaining a competitive performance, the number of degrees of freedom is drastically reduced to 15,111 and 486 parameters for the primary decoder and the remaining regression network, respectively. The underlying methodology is general and can easily be extended to more complex physical descriptions with a minimal amount of data required.

PLASM-PHOct 10, 2018
Machine learning plasma-surface interface for coupling sputtering and gas-phase transport simulations

Florian Krüger, Tobias Gergs, Jan Trieschmann

Thin film processing by means of sputter deposition inherently depends on the interaction of energetic particles with a target surface and the subsequent particle transport. The length and time scales of the underlying physical phenomena span orders of magnitudes. A theoretical description which bridges all time and length scales is not practically possible. Advantage can be taken particularly from the well-separated time scales of the fundamental surface and plasma processes. Initially, surface properties may be calculated from a surface model and stored for a number of representative cases. Subsequently, the surface data may be provided to gas-phase transport simulations via appropriate model interfaces (e.g., analytic expressions or look-up tables) and utilized to define insertion boundary conditions. During run-time evaluation, however, the maintained surface data may prove to be not sufficient. In this case, missing data may be obtained by interpolation (common), extrapolation (inaccurate), or be supplied on-demand by the surface model (computationally inefficient). In this work, a potential alternative is established based on machine learning techniques using artificial neural networks. As a proof of concept, a multilayer perceptron network is trained and verified with sputtered particle distributions obtained from transport of ions in matter based simulations for Ar projectiles bombarding a Ti-Al composite. It is demonstrated that the trained network is able to predict the sputtered particle distributions for unknown, arbitrarily shaped incident ion energy distributions. It is consequently argued that the trained network may be readily used as a machine learning based model interface (e.g., by quasi-continuously sampling the desired sputtered particle distributions from the network), which is sufficiently accurate also in scenarios which have not been previously trained.