Yujie Zhang

Junhui Rao, Yi Liu, Jichen Zhang et al.

This paper proposes a novel analytical framework, denoted the Multiport Analytical Pixel Electromagnetic Simulator (MAPES). MAPES enables efficient and accurate prediction of the electromagnetic (EM) performance of arbitrary pixel-based microwave (MW) and RFIC structures. Unlike the Internal Multiport Method (IMPM), which optimizes only connecting elements within a fixed, gap-separated pixel skeleton, MAPES operates directly on the all-pixel presence/absence formulation used in recent MW/RFIC design. This is enabled by diagonal virtual pixels, an occupancy-to-load mapping, and a multi-layer/via port-level formulation that have no counterpart in IMPM. By introducing virtual pixels and diagonal virtual pixels and inserting virtual ports at critical positions, MAPES captures all horizontal, vertical, and diagonal electromagnetic couplings within a single multiport impedance matrix. Only a small set of full-wave simulations (typically about 1% of the datasets required by AI-assisted EM emulators) is needed to construct this matrix. Subsequently, any arbitrary pixel configuration can be evaluated analytically using a closed-form multiport relation without additional full-wave calculations. The proposed approach eliminates data-driven overfitting and ensures accurate results across all design variations. Using MAPES, comprehensive examples for single- and double-layer PCBs and CMOS processes (180 nm and 65 nm) confirm that high prediction accuracy with 600-2000$\times$ speed improvement is achieved compared to CST simulations. Owing to its efficiency, scalability, and reliability, MAPES provides a practical and versatile tool for AI-assisted MW circuit and RFIC design across diverse fabrication technologies.

Yujie Zhang, Wenjing Ye

Layout design with complex constraints is a challenging problem to solve due to the non-uniqueness of the solution and the difficulties in incorporating the constraints into the conventional optimization-based methods. In this paper, we propose a design method based on the recently developed machine learning technique, Variational Autoencoder (VAE). We utilize the learning capability of the VAE to learn the constraints and the generative capability of the VAE to generate design candidates that automatically satisfy all the constraints. As such, no constraints need to be imposed during the design stage. In addition, we show that the VAE network is also capable of learning the underlying physics of the design problem, leading to an efficient design tool that does not need any physical simulation once the network is constructed. We demonstrated the performance of the method on two cases: inverse design of surface diffusion induced morphology change and mask design for optical microlithography.