Embedding-Enhanced Probabilistic Modeling of Ferroelectric Field Effect Transistors (FeFETs)
This work addresses the problem of reliable and robust modeling of FeFETs for memory and logic technology designers, offering a scalable solution for variability-aware simulation, though it is incremental as it builds upon existing Mixture Density Network methods.
The paper tackled the challenge of accurately modeling the inherent randomness in ferroelectric field-effect transistors (FeFETs) due to operational and fabrication variability, resulting in a probabilistic modeling framework that achieved an R2 of 0.92 in capturing current behavior variability.
FeFETs hold strong potential for advancing memory and logic technologies, but their inherent randomness arising from both operational cycling and fabrication variability poses significant challenges for accurate and reliable modeling. Capturing this variability is critical, as it enables designers to predict behavior, optimize performance, and ensure reliability and robustness against variations in manufacturing and operating conditions. Existing deterministic and machine learning-based compact models often fail to capture the full extent of this variability or lack the mathematical smoothness required for stable circuit-level integration. In this work, we present an enhanced probabilistic modeling framework for FeFETs that addresses these limitations. Building upon a Mixture Density Network (MDN) foundation, our approach integrates C-infinity continuous activation functions for smooth, stable learning and a device-specific embedding layer to capture intrinsic physical variability across devices. Sampling from the learned embedding distribution enables the generation of synthetic device instances for variability-aware simulation. With an R2 of 0.92, the model demonstrates high accuracy in capturing the variability of FeFET current behavior. Altogether, this framework provides a scalable, data-driven solution for modeling the full stochastic behavior of FeFETs and offers a strong foundation for future compact model development and circuit simulation integration.