Haoyu Yang

Xiaoxiao Liang, Haoyu Yang, Kang Liu et al.

Optical proximity correction (OPC) is a vital step to ensure printability in modern VLSI manufacturing. Various OPC approaches based on machine learning have been proposed to pursue performance and efficiency, which are typically data-driven and hardly involve any particular considerations of the OPC problem, leading to potential performance or efficiency bottlenecks. In this paper, we propose CAMO, a reinforcement learning-based OPC system that specifically integrates important principles of the OPC problem. CAMO explicitly involves the spatial correlation among the movements of neighboring segments and an OPC-inspired modulation for movement action selection. Experiments are conducted on both via layer patterns and metal layer patterns. The results demonstrate that CAMO outperforms state-of-the-art OPC engines from both academia and industry.

Haoyu Yang, Shuhe Li, Bei Yu

Capsule networks are recently proposed as an alternative to modern neural network architectures. Neurons are replaced with capsule units that represent specific features or entities with normalized vectors or matrices. The activation of lower layer capsules affects the behavior of the following capsules via routing links that are constructed during training via certain routing algorithms. We discuss the routing-by-agreement scheme in dynamic routing algorithm which, in certain cases, leads the networks away from optimality. To obtain better and faster convergence, we propose a routing algorithm that incorporates a regularized quadratic programming problem which can be solved efficiently. Particularly, the proposed routing algorithm targets directly on the discriminative power of class capsules making the correct decision on input instances. We conduct experiments on MNIST, MNIST-Fashion, and CIFAR-10 and show competitive classification results compared to existing capsule networks.

Guyue Huang, Jingbo Hu, Yifan He et al.

With the down-scaling of CMOS technology, the design complexity of very large-scale integrated (VLSI) is increasing. Although the application of machine learning (ML) techniques in electronic design automation (EDA) can trace its history back to the 90s, the recent breakthrough of ML and the increasing complexity of EDA tasks have aroused more interests in incorporating ML to solve EDA tasks. In this paper, we present a comprehensive review of existing ML for EDA studies, organized following the EDA hierarchy.

Haoyu Yang, Wei Zhong, Yuzhe Ma et al.

VLSI mask optimization is one of the most critical stages in manufacturability aware design, which is costly due to the complicated mask optimization and lithography simulation. Recent researches have shown prominent advantages of machine learning techniques dealing with complicated and big data problems, which bring potential of dedicated machine learning solution for DFM problems and facilitate the VLSI design cycle. In this paper, we focus on a heterogeneous OPC framework that assists mask layout optimization. Preliminary results show the efficiency and effectiveness of proposed frameworks that have the potential to be alternatives to existing EDA solutions.

Haoyu Yang, Wen Chen, Piyush Pathak et al.

Machine learning-based lithography hotspot detection has been deeply studied recently, from varies feature extraction techniques to efficient learning models. It has been observed that such machine learning-based frameworks are providing satisfactory metal layer hotspot prediction results on known public metal layer benchmarks. In this work, we seek to evaluate how these machine learning-based hotspot detectors generalize to complicated patterns. We first introduce a automatic layout generation tool that can synthesize varies layout patterns given a set of design rules. The tool currently supports both metal layer and via layer generation. As a case study, we conduct hotspot detection on the generated via layer layouts with representative machine learning-based hotspot detectors, which shows that continuous study on model robustness and generality is necessary to prototype and integrate the learning engines in DFM flows. The source code of the layout generation tool will be available at https://github. com/phdyang007/layout-generation.

Kang Liu, Haoyu Yang, Yuzhe Ma et al.

There is substantial interest in the use of machine learning (ML) based techniques throughout the electronic computer-aided design (CAD) flow, particularly those based on deep learning. However, while deep learning methods have surpassed state-of-the-art performance in several applications, they have exhibited intrinsic susceptibility to adversarial perturbations --- small but deliberate alterations to the input of a neural network, precipitating incorrect predictions. In this paper, we seek to investigate whether adversarial perturbations pose risks to ML-based CAD tools, and if so, how these risks can be mitigated. To this end, we use a motivating case study of lithographic hotspot detection, for which convolutional neural networks (CNN) have shown great promise. In this context, we show the first adversarial perturbation attacks on state-of-the-art CNN-based hotspot detectors; specifically, we show that small (on average 0.5% modified area), functionality preserving and design-constraint satisfying changes to a layout can nonetheless trick a CNN-based hotspot detector into predicting the modified layout as hotspot free (with up to 99.7% success). We propose an adversarial retraining strategy to improve the robustness of CNN-based hotspot detection and show that this strategy significantly improves robustness (by a factor of ~3) against adversarial attacks without compromising classification accuracy.

Haoyu Yang, Shuhe Li, Cyrus Tabery et al.

Layout hotpot detection is one of the main steps in modern VLSI design. A typical hotspot detection flow is extremely time consuming due to the computationally expensive mask optimization and lithographic simulation. Recent researches try to facilitate the procedure with a reduced flow including feature extraction, training set generation and hotspot detection, where feature extraction methods and hotspot detection engines are deeply studied. However, the performance of hotspot detectors relies highly on the quality of reference layout libraries which are costly to obtain and usually predetermined or randomly sampled in previous works. In this paper, we propose an active learning-based layout pattern sampling and hotspot detection flow, which simultaneously optimizes the machine learning model and the training set that aims to achieve similar or better hotspot detection performance with much smaller number of training instances. Experimental results show that our proposed method can significantly reduce lithography simulation overhead while attaining satisfactory detection accuracy on designs under both DUV and EUV lithography technologies.